China Material Technology Co., Ltd.

sputtering target(1)

China Material Technology Co., Ltd.

Showing 21 - 24 of 24, total 3 pages [First] [Previous] [Next] [Last]

co cobalt sputtering target for coating film
Specification: industrial-grade coating, experiments or research level Co powde
Detail: Specifications Size 01: diameter <360mm thickness> 1 mm (wafer / round table / rod) Size 02: length <300mm width <300mm thickness> 1mm rectangular / sheet / step-like (splicing) Size 03: outer diameter <360mm inn...

multi-arc silicon target(mat-cn)
Specification: Size 01: diameter <360mm thickness> 1 mm (wafer / round table /
Detail: is_customized:Yes Grade:Si Application:Industrial grade coating Content(percent):99.999% Brand Name:MAT-CN Model Number:Si-T Product Type:Metal Composition:Si Size:support any size Error:Min-error Density:H...

laboratory copper target-ceramic target-sputtering
Specification: Size 01: diameter <360mm thickness> 1 mm (wafer / round table /
Detail: Cu target 99.99% Physical properties Color Copper red Density 8.96g/ml Melting point 1084 Technical indicators purity 99.99% Relative density >99% Cut surface flatness 3.2R...

sputtering target ito (bonding cu)99.99% virtual p
Specification: Size 01: diameter <360mm thickness> 1 mm (wafer / round table /
Detail: Physical properties Color Gray Density 7.14g/ml Melting point 1500-1900 Technical indicators purity 99.99% Relative density >99% Cut surface flatness 3.2Ra Tolerance ±0.1mm grain ...


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